The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Jul. 22, 2011
Chih-hung Chang, Corvallis, OR (US);
Seung-yeol Han, Corvallis, OR (US);
Brian K. Paul, Corvallis, OR (US);
Chih-hung Chang, Corvallis, OR (US);
Seung-Yeol Han, Corvallis, OR (US);
Brian K. Paul, Corvallis, OR (US);
Abstract
Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of anti-reflective films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate to form a nanostructured, anti-reflective coating. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. In some embodiments, a scratch-resistant, anti-reflective coating is applied to a polycarbonate substrate, such as a lens. In certain embodiments, an anti-reflective coating is applied to a surface of a solar catalytic microreactor suitable for performing endothermic reactions, where energy is provided to the reactor by absorption of solar radiation. The composition and morphology of the material deposited on a substrate can be tailored. The process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.