The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Nov. 23, 2011
Timothy Poston, Singapore, SG;
Timothy Poston, Singapore, SG;
Animoto, Inc., New York, NY (US);
Abstract
Techniques are provided for glyph rendering based on a polygon mesh having vertices located away from a glyph's outline. Skeletonisation may be used to establish polygonal skeletons in the interior region of a glyph and in the outside region of the glyph. Transepts oriented away from the glyph's outline may be generated for nodes on the glyph's outline. A polygon mesh may be generated with vertices constrained to be selected from a set of candidate vertices comprising termination points of transepts, skeleton nodes, and/or points on the glyph's bounding boxes. Implicit forms may be determined from curves or lines representing segments of the glyph's outline, without use of Bézier control points and endpoints. These implicit forms along with tessellation data may be provided to a computing device as glyph rendering data for rendering the glyph at runtime.