The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2013

Filed:

Mar. 01, 2013
Applicants:

Hiroshi Umino, Kanagawa, JP;

Nobuhiro Yamada, Kanagawa, JP;

Tsutomu Katagiri, Kanagawa, JP;

Hiromitsu Shibuya, Kanagawa, JP;

Shuichi Oguro, Kanagawa, JP;

Naoyoshi Iwasaki, Kanagawa, JP;

Inventors:

Hiroshi Umino, Kanagawa, JP;

Nobuhiro Yamada, Kanagawa, JP;

Tsutomu Katagiri, Kanagawa, JP;

Hiromitsu Shibuya, Kanagawa, JP;

Shuichi Oguro, Kanagawa, JP;

Naoyoshi Iwasaki, Kanagawa, JP;

Assignee:

JGC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/00 (2006.01); C01B 17/16 (2006.01); C01B 17/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

A reactor for synthesizing hydrogen sulfide in which sulfur and hydrogen are subjected to gas-phase reaction in the absence of a catalyst to synthesize hydrogen sulfide, the reactor including: a reactor body that retains liquid sulfur in a bottom portion thereof; a heating unit that gasifies part of the liquid sulfur; a hydrogen gas supply unit that supplies hydrogen gas into the liquid sulfur; and a heat-exchanging portion provided in a gas-phase reaction region located above the liquid surface of the liquid sulfur in the reactor body, wherein heat-exchanging portion is configured such that the reaction temperature in the gas-phase reaction region is controlled to be within a predetermined temperature range by changing the heat exchange amount per unit volume in a gas-phase reaction region located farther from the liquid surface from the heat exchange amount per unit volume in a gas-phase reaction region located closer to the liquid surface.


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