The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Aug. 24, 2009
Jae-hyun Kim, Daejeon, KR;
Hak-joo Lee, Daejeon, KR;
Seung-min Hyun, Daejeon, KR;
Hyun-ju Choi, Daejeon, KR;
Byung-ik Choi, Daejeon, KR;
Ki-don Kim, Daejeon, KR;
Dae-guen Choi, Daejeon, KR;
Jae-Hyun Kim, Daejeon, KR;
Hak-Joo Lee, Daejeon, KR;
Seung-Min Hyun, Daejeon, KR;
Hyun-Ju Choi, Daejeon, KR;
Byung-Ik Choi, Daejeon, KR;
Ki-Don Kim, Daejeon, KR;
Dae-Guen Choi, Daejeon, KR;
Korea Institute of Machinery & Materials, Daejeon, KR;
Abstract
Provided are a shape of a hierarchical structure, an engineering effect of the hierarchical structure according to the shape, an increasing method of the engineering effect, an application method of the hierarchical structure for novel material or parts, and a mass-manufacturing method of the hierarchical structure. The present invention relates to a hierarchical structure and a manufacturing method thereof, and includes a hierarchical structure in which at least one nano-object that has a characteristic length of a nanoscale region in an internal matrix is arranged in a predetermined pattern. According to the exemplary embodiments of the present invention, an excellent characteristic that is generated in a nanoscale region may be used in a structure of a macroscopic scale region, and structures that have different scales may be simply interconnected or interfaced regardless of the different scales.