The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Dec. 22, 2008
Amanda Baer, Campbell, CA (US);
Wen-chien David Hsiao, San Jose, CA (US);
John I. Kim, San Jose, CA (US);
Vladimir Nikitin, Campbell, CA (US);
Trevor W. Olson, San Jose, CA (US);
John Bruce Piggott, Jr., San Jose, CA (US);
Yuan Yao, Fremont, CA (US);
Amanda Baer, Campbell, CA (US);
Wen-Chien David Hsiao, San Jose, CA (US);
John I. Kim, San Jose, CA (US);
Vladimir Nikitin, Campbell, CA (US);
Trevor W. Olson, San Jose, CA (US);
John Bruce Piggott, Jr., San Jose, CA (US);
Yuan Yao, Fremont, CA (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
A method in one embodiment includes forming a layer of a nonmagnetic material above an upper surface of a substrate; forming a resist structure above the layer of nonmagnetic material, wherein the resist structure has an undercut; removing a portion of the layer of nonmagnetic material not covered by the resist structure; depositing a layer of magnetic material above the substrate adjacent a remaining portion of the layer of nonmagnetic material such that at least portions of the layer of magnetic material and the remaining portion of the layer of nonmagnetic material lie in a common plane; removing the resist structure; and forming a write pole above the layer of magnetic material and the remaining portion of the layer of nonmagnetic material. Additional methods are also presented.