The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Sep. 14, 2012
Applicants:
Osamu Nakayama, Tainai, JP;
Takashi Fukumoto, Tainai, JP;
Inventors:
Osamu Nakayama, Tainai, JP;
Takashi Fukumoto, Tainai, JP;
Assignee:
Kuraray Co., Ltd., Kurashiki-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07D 339/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided are 1) a production process for an acrylic ester derivative capable of being a raw material of a polymer for obtaining a photoresist composition capable of forming a photoresist film which is excellent in a reactivity to acid and a heat stability and is less swollen in developing and which has a refractive index of preferably 1.72 or more in 193 nm and can be patterned, 2) an acrylic ester derivative obtained by the above production process and 3) alcohol and ester which are synthetic intermediates for the above acrylic ester derivative.