The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Jun. 25, 2012
Applicants:
Junko Miyasaka, Tokyo, JP;
Akio Koike, Tokyo, JP;
Tomonori Ogawa, Tokyo, JP;
Inventors:
Assignee:
Asahi Glass Company, Limited, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 3/06 (2006.01); C03C 3/076 (2006.01); C03C 3/112 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.