The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Feb. 24, 2011
Applicants:
Sangkyun Kim, Yongin-si, KR;
Namsoo Kim, Suwon-si, KR;
Jongwoo Kim, Hwaseong-si, KR;
Yun-jeong Kim, Suwon-si, KR;
Inventors:
Sangkyun Kim, Yongin-si, KR;
NamSoo Kim, Suwon-si, KR;
JongWoo Kim, Hwaseong-si, KR;
Yun-Jeong Kim, Suwon-si, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polishing slurry includes an abrasive, a dispersion agent, a polish accelerating agent and an adhesion inhibitor. The adhesion inhibitor includes a benzene compound combined with a carboxyl group. Methods of planarizing an insulating layer using the slurry are also provided.
Kim, Sangkyun. (2013). Slurry for polishing and planarization method of insulating layer using the same (U.S. Patent No. 8546261). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8546261
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile