The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2013

Filed:

Nov. 24, 2010
Applicants:

Koji Ichikawa, Toyonaka, JP;

Takayuki Miyagawa, Toyonaka, JP;

Mitsuhiro Hata, Delmar, NY (US);

Inventors:

Koji Ichikawa, Toyonaka, JP;

Takayuki Miyagawa, Toyonaka, JP;

Mitsuhiro Hata, Delmar, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rrepresents an aromatic group which can have one or more substituents, Rand Rindependently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rand Rindependently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rand Rare bonded each other to form an alkanediyl group, Rrepresents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rrepresents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rand Rare bonded each other to form an alkanediyl group.


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