The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Mar. 12, 2008
Applicant:
Shingo Imanishi, Kanagawa, JP;
Inventor:
Shingo Imanishi, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B41M 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pattern-formed substrate is provided. The pattern-formed substrate includes a substrate base, an organic thin film and an inorganic resist film stacked on the substrate base in this order, and patterns having predetermined aspect ratios formed on the organic thin film and the inorganic resist film, respectively. The pattern of the organic thin film is formed by selective etching using the pattern of the inorganic resist film as a mask.