The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8545292 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 01, 2013

Filed:

May. 19, 2010
Applicants:

Tomoaki Shinchi, Osaka, JP;

Hiroshi Suzaki, Osaka, JP;

Inventors:

Tomoaki Shinchi, Osaka, JP;

Hiroshi Suzaki, Osaka, JP;

Assignee:

DIC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 3/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a two-component urethane resin composition for a polishing pad including a base resin containing an isocyanate group-terminated urethane prepolymer (A) and a curing agent containing an isocyanate group reactive compound (B), and characterized in that the prepolymer (A) is a prepolymer having an isocyanate group equivalent of 250 to 700 and being produced by reacting a polyisocyanate (a1) with an aromatic polyester polyol (a2) and a polyether polyol (a3) which are used as polyol components in combination at a mass ratio of (a2)/(a3)=5/95 to 70/30, and the aromatic polyester polyol (a2) has 2 to 11 aromatic rings in its molecular chain, and also relates to a polyurethane polishing pad using the resin composition and a method for producing a polyurethane polishing pad.


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Shinchi, Tomoaki. (2013). Two-component urethane resin composition for polishing pad, polyurethane polishing pad, and method for producing polyurethane polishing pad (U.S. Patent No. 8545292). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8545292

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