The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Jul. 16, 2010
Takashi Seki, Yokohama, JP;
Suzushi Nishimura, Yokohama, JP;
Maki Fukuda, Yokohama, JP;
Madoka Fukushima, Yokohama, JP;
Satoshi Masuyama, Yokohama, JP;
Soon Moon Jeong, Yokohama, JP;
Hideo Takezoe, Tokyo, JP;
Won Hoe Koo, Tokyo, JP;
Takashi Seki, Yokohama, JP;
Suzushi Nishimura, Yokohama, JP;
Maki Fukuda, Yokohama, JP;
Madoka Fukushima, Yokohama, JP;
Satoshi Masuyama, Yokohama, JP;
Soon Moon Jeong, Yokohama, JP;
Hideo Takezoe, Tokyo, JP;
Won Hoe Koo, Tokyo, JP;
JX Nippon Oil & Energy Corporation, Tokyo, JP;
Abstract
A diffraction grating having a transparent supporting substrate; and a cured resin layer which is stacked on the transparent supporting substrate and which has concavities and convexities formed on a surface thereof, wherein when a Fourier-transformed image is obtained by performing two-dimensional fast Fourier transform processing on a concavity and convexity analysis image obtained by analyzing a shape of the concavities and convexities formed on the surface of the cured resin layer by use of an atomic force microscope, the Fourier-transformed image shows a circular or annular pattern substantially centered at an origin at which an absolute value of wavenumber is 0 μm, and the circular or annular pattern is present within a region where an absolute value of wavenumber is within a range of 10 μmor less.