The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2013

Filed:

Dec. 16, 2011
Applicants:

Takashi Fukumoto, Niigata, JP;

Ichihiro Aratani, Niigata, JP;

Inventors:

Takashi Fukumoto, Niigata, JP;

Ichihiro Aratani, Niigata, JP;

Assignee:

Kuraray Co., Ltd., Kurashiki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 307/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polymer compound for a photoresist composition (a) having a high dissolution rate in a developing solution after exposure and (b) exhibiting little swelling during development. A tertiary alcohol derivative that is a raw material for the polymer compound. A tertiary alcohol that is an intermediate of the tertiary alcohol derivative. The tertiary alcohol is represented by formula (3): wherein Rand Rindividually represent a linear, branched or cyclic alkylene group having 2 to 9 carbon atoms, which may contain an oxygen atom, and wherein Rand Rmay together form a ring with a carbon atom to which Rand Rare bonded.


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