The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Jul. 04, 2007
Applicants:
Christophe Fringant, Tavaux, FR;
Yves Vanderveken, Hervelee, BE;
Patrick Lacroix-desmazes, Montpellier, FR;
Jeff Tonnar, Kehlen, LU;
Inventors:
Christophe Fringant, Tavaux, FR;
Yves Vanderveken, Hervelee, BE;
Patrick Lacroix-Desmazes, Montpellier, FR;
Jeff Tonnar, Kehlen, LU;
Assignee:
Solvay (Societe Anonyme), Brussels, BE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/16 (2006.01);
U.S. Cl.
CPC ...
Abstract
Process of controlled free-radical polymerization in aqueous dispersion for the preparation of a block copolymer at least one block of which is a block of a halogenated polymer using molecular iodine and at least one oxidant whose solubility in water is at least 10 g/l for the synthesis of the first block of the block copolymer.