The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Apr. 04, 2011
Pramod Kandanarachchi, Brecksville, OH (US);
Kazuyoshi Fujita, Tokyo, JP;
Steven Smith, Perrysburg, OH (US);
Larry F. Rhodes, Silver Lake, OH (US);
Pramod Kandanarachchi, Brecksville, OH (US);
Kazuyoshi Fujita, Tokyo, JP;
Steven Smith, Perrysburg, OH (US);
Larry F. Rhodes, Silver Lake, OH (US);
Promerus, LLC, Brecksville, OH (US);
Abstract
Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.