The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2013

Filed:

May. 10, 2011
Applicants:

Jinsoo Joo, Seoul, KR;

Young Ki Hong, Seoul, KR;

Dong Hyuk Park, Seoul, KR;

Seong Gi JO, Incheon, KR;

Min Ho Koo, Seoul, KR;

Inventors:

Jinsoo Joo, Seoul, KR;

Young Ki Hong, Seoul, KR;

Dong Hyuk Park, Seoul, KR;

Seong Gi Jo, Incheon, KR;

Min Ho Koo, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B 6/68 (2006.01); C08G 61/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to one embodiment of the present invention, a portion of a light-emitting polymer material or a conductive polymer material can be irradiated with a focused electron beam, so that the physical properties of that portion can be modified. For this purpose, one embodiment of the present invention comprises an apparatus for modifying the physical properties of a nanostructure using a focused electron beam, the apparatus comprising: a nanostructure; a focused electron beam-irradiating unit that serves to irradiate a nanoscale electron beam such that it is focused on the nanostructure; and a focused electron beam-controlling unit that serves to control the irradiation position of the nanoscale electron beam so as to modify the physical property of a portion of the nanostructure.


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