The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Nov. 16, 2011
Yuichi Hamada, Gunma, JP;
Yuichi Hamada, Gunma, JP;
Shin-Etsu Chemical Co. Ltd., Tokyo, JP;
Abstract
A method of adhering a lithographic pellicle includes steps of pressing the pellicle frametoward the exposure stencilby a pressure platevia a bagcontaining a low viscosity liquid being mounted on the surface of the pressure platefacing the pellicle frameso as to be along sides of the pellicle frameand face the pellicle frame, the compressively deformable member being easily deformable when a pressure is applied thereonto. According to the thus constituted method of adhering a pellicle, it is possible to uniformize a pressure applied onto an exposure stencilsuch as a photomask, a reticle or the like via a pellicle framewhen a pellicle is adhered onto the exposure stencil