The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2013

Filed:

Aug. 18, 2006
Applicants:

Philipp Smole, Buchs, CH;

Michael Lanker, Pfaffikon, CH;

Claus Heine-kempkens, Maienfeld, CH;

Inventors:

Philipp Smole, Buchs, CH;

Michael Lanker, Pfaffikon, CH;

Claus Heine-Kempkens, Maienfeld, CH;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention concerns a method of producing subsurface marking in a transparent body. According to the invention, the marking is done less than 500 μm below the surface by applying a layer system with a high destruction threshold, compared to the substrate, to the surface of the substrate. If the layer system is designed as an anti-reflection coating system for the reading wavelength, it increases the contrast for reading. If the layer system is designed as a mirror for the writing wavelength, the writing can be done in reflection at a lower intensity.


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