The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Oct. 22, 2007
Yasuhide Kawaguchi, Yokohama, JP;
Akihiko Asakawa, Yokohama, JP;
Yasuhide Kawaguchi, Yokohama, JP;
Akihiko Asakawa, Yokohama, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
A photocurable composition capable of producing a micropattern-formed product efficiently, which is excellent in physical properties such as heat resistance, chemical resistance, releasability and optical characteristics (transmittance and low refractive index), and a process for producing a micropattern-formed product, capable of highly precisely transferring a micropattern of a mold to its surface are provided. A photocurable composition which comprises from 50 to 98 mass % of a monomer containing no fluorine atom and having a viscosity at 25° C. of from 0.1 to 100 mPa·s, from 0.1 to 45 mass % of a fluoromonomer, from more than 0.1 to 20 mass % of a fluorinated surfactant and/or a fluoropolymer and from 1 to 10 mass % of a photopolymerization initiator, and contains substantially no solvent. A process for producing a micropattern-formed product comprising a cured product having a micropattern of a mold transferred on its surface, or such a micropattern-formed product integrated with a substrate, which uses the photocurable composition, a substrate and a mold having a micropattern.