The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Oct. 28, 2010
Hiroyuki Yasukochi, Kanagawa, JP;
Hiroyuki Yasukochi, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A three-dimensional stereolithography apparatus includes a stage, a support mechanism to support a film so that the film is opposed to the stage, a pressing mechanism, a supply mechanism, an irradiation unit, a movement mechanism, and a control mechanism. The pressing mechanism presses at least a linear area of the film so that the linear area closest to the stage is formed in the film. The supply mechanism supplies a light-curing material into a slit area formed between the stage and the linear area. The irradiation unit irradiates the light-curing material supplied into the slit area with laser light through the pressing mechanism and the film. The movement mechanism moves the stage and the pressing mechanism relatively to the film, to form one cured layer of the light-curing material. The control mechanism controls a distance between the stage and the linear area of the film, to stack the cured layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile