The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2013

Filed:

Jul. 12, 2012
Applicants:

Mark C. Reuter, Montrose, NY (US);

Brian A. Bryce, Ithaca, NY (US);

Bojan R. Ilic, Ithaca, NY (US);

Sandip Tiwari, Ithaca, NY (US);

Inventors:

Mark C. Reuter, Montrose, NY (US);

Brian A. Bryce, Ithaca, NY (US);

Bojan R. Ilic, Ithaca, NY (US);

Sandip Tiwari, Ithaca, NY (US);

Assignees:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 60/38 (2010.01); H01L 21/306 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
Abstract

A method of creating a probe for scanned probe microscopy is disclosed. The method includes providing a wafer having a support wafer layer and a device layer. The method includes masking the wafer with a masking layer. The method includes removing a portion of the masking layer at the device layer. The method includes etching the wafer along the portion of the masking layer that has been removed to create a crystal facet surface that is oriented at a tilt angle. The method includes epitaxially growing a tip along the crystal facet surface.


Find Patent Forward Citations

Loading…