The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8536059 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 17, 2013

Filed:

Feb. 18, 2008
Applicants:

Khurshid Syed Alam, Mountain View, CA (US);

Evgeni Gousev, Saratoga, CA (US);

Marc Maurice Mignard, San Jose, CA (US);

David Heald, Solvang, CA (US);

Ana R. Londergan, Santa Clara, CA (US);

Philip Don Floyd, Redwood City, CA (US);

Inventors:

Khurshid Syed Alam, Mountain View, CA (US);

Evgeni Gousev, Saratoga, CA (US);

Marc Maurice Mignard, San Jose, CA (US);

David Heald, Solvang, CA (US);

Ana R. Londergan, Santa Clara, CA (US);

Philip Don Floyd, Redwood City, CA (US);

Assignee:

QUALCOMM MEMS Technologies, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01);
U.S. Cl.
CPC ...
Abstract

Etching equipment and methods are disclosed herein for more efficient etching of sacrificial material from between permanent MEMS structures. An etching head includes an elongate etchant inlet structure, which may be slot-shaped or an elongate distribution of inlet holes. A substrate is supported in proximity to the etching head in a manner that defines a flow path substantially parallel to the substrate face, and permits relative motion for the etching head to scan across the substrate.


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