The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Sep. 26, 2008
Han Soo Kim, Daejeon, KR;
Sung Hyun Kim, Daejeon, KR;
Dong Chang Choi, Daejeon, KR;
Kyung Soo Choi, Hanam, KR;
Ho Chan Ji, Daejeon, KR;
Min Young Lim, Seongnam, KR;
Geun Young Cha, Daejeon, KR;
Yoon Hee Heo, Daejeon, KR;
Ji Heum Yoo, Daejeon, KR;
Sun Hwa Kim, Daejeon, KR;
Han Soo Kim, Daejeon, KR;
Sung Hyun Kim, Daejeon, KR;
Dong Chang Choi, Daejeon, KR;
Kyung Soo Choi, Hanam, KR;
Ho Chan Ji, Daejeon, KR;
Min Young Lim, Seongnam, KR;
Geun Young Cha, Daejeon, KR;
Yoon Hee Heo, Daejeon, KR;
Ji Heum Yoo, Daejeon, KR;
Sun Hwa Kim, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.