The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Mar. 21, 2012
Applicants:
Binod B. DE, Attleboro, MA (US);
Ognian N. Dimov, Warwick, RI (US);
Stephanie J. Dilocker, East Providence, RI (US);
Inventors:
Binod B. De, Attleboro, MA (US);
Ognian N. Dimov, Warwick, RI (US);
Stephanie J. Dilocker, East Providence, RI (US);
Assignee:
Fujifilm Electronic Materials, U.S.A., Inc., North Kingstown, RI (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/028 (2006.01);
U.S. Cl.
CPC ...
Abstract
An etch resistant thermally curable Underlayer composition for use in a multiplayer lithographic process for producing a photolithographic bilayer coated substrate, the composition being a composition of:
De, Binod. (2013). Thermally cured underlayer for lithographic application (U.S. Patent No. 8535872). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8535872
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile