The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2013

Filed:

Dec. 13, 2011
Applicants:

Chul-hwan Choi, Daejeon, KR;

Jeong-seok Lee, Daejeon, KR;

Kwang-wook Choi, Daejeon, KR;

Joon-ho Shin, Daejeon, KR;

Dong-kyu Kim, Daejeon, KR;

Inventors:

Chul-Hwan Choi, Daejeon, KR;

Jeong-Seok Lee, Daejeon, KR;

Kwang-Wook Choi, Daejeon, KR;

Joon-Ho Shin, Daejeon, KR;

Dong-Kyu Kim, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 3/00 (2006.01); C01B 33/107 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is provided a method for a purification of trichlorosilane, the method including: performing a pretreatment for separating a chlorosilane mixture from reaction products of a trichlorosilane production reaction; performing a first purification for separating the chlorosilane mixture into a first top stream and a first bottom stream; performing a second purification for separating the first top stream into a second top stream and a second bottom stream; and performing a third purification for separating the second bottom stream into a third top stream and a third bottom stream, wherein the performing of the third purification is carried out under pressure conditions higher than those of the performing of the second purification, and a heat exchange is generated between the second bottom stream and the third top stream.


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