The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2013
Filed:
Jul. 28, 2011
Christopher Robert Hazard, Niskayuna, NY (US);
Christopher Robert Hazard, Niskayuna, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
Methods and non-transitory computer readable media that store executable instructions to perform a method for reducing motion artifacts in shear wave measurements are presented. Accordingly, reference pulses are delivered to a common motion tracking location (CMTL) and a plurality of target locations in a region of interest (ROI) to detect corresponding initial positions. Further, a shear wave is generated and tracked in the ROI using tracking pulses delivered to the CMTL and the plurality of target locations for determining corresponding displacements. Additionally, an average displacement of the CMTL is computed. Further, a motion corrected displacement for a target location in the plurality of target locations is estimated based on a displacement of the target location at a particular time, a corresponding displacement of the CMTL measured proximate in time to the measurement of the displacement of the target location and the average displacement of the CMTL.