The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2013
Filed:
Jan. 09, 2008
Jonathan Hudson Connell, Cortlandt Manor, NY (US);
Nalini Kanta Ratha, Yorktown Heights, NY (US);
Jonathan Hudson Connell, Cortlandt Manor, NY (US);
Nalini Kanta Ratha, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Techniques for generating a distorted template for a given facial image are provided. First, at least one facial feature point from a given facial image is selected. The selected facial feature has location information associated therewith. A representation of a region proximate to the selected facial feature point is then generated. Next, the location information associated with the selected facial feature point and/or the representation of the region proximate to the selected facial feature point are distorted. A distorted template is then formed, wherein the distorted template comprises the distorted location information associated with the selected facial feature point and/or the distorted representation of the region proximate to the selected facial feature point.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile