The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2013

Filed:

Sep. 15, 2011
Applicants:

Jefferson Wagener, Morristown, NJ (US);

Susumu Nakaya, Sakura, JP;

Takaaki Ishikawa, Sakura, JP;

Inventors:

Jefferson Wagener, Morristown, NJ (US);

Susumu Nakaya, Sakura, JP;

Takaaki Ishikawa, Sakura, JP;

Assignees:

Nistica, Inc., Bridgewater, NJ (US);

Fujikura Ltd., Tokyo, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus is provided for processing an optical beam. The method includes spatially dispersing an optical beam received from an optical port into a plurality of wavelength components. The wavelength components are focused and at least one of the components is selectively directed to one of the optical ports by reflecting the focused wavelength component at least twice from a DMD before being directed to a selected one of the optical ports. A resolution of the focused wavelength component is optimized when it is reflected from the DMD a first or second time at the expense of the other time when it is reflected.


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