The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2013
Filed:
Jun. 23, 2011
Satoshi Kawaguchi, Tokyo, JP;
Hidekazu Okamoto, Tokyo, JP;
Yu Takeuchi, Tokyo, JP;
Hirokazu Takagi, Tokyo, JP;
Kunio Watanabe, Tokyo, JP;
Koichi Yanase, Tokyo, JP;
Satoshi Kawaguchi, Tokyo, JP;
Hidekazu Okamoto, Tokyo, JP;
Yu Takeuchi, Tokyo, JP;
Hirokazu Takagi, Tokyo, JP;
Kunio Watanabe, Tokyo, JP;
Koichi Yanase, Tokyo, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
The object is to provide a process for producing highly pure 2,3,3,3-tetrafluoropropene, whereby formation of 3,3,3-trifluoropropene is suppressed. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound composed of 1,1-dichloro-2,3,3,3-tetrafluoropropene and/or 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen in a gas phase in a reactor having a catalyst layer packed with a catalyst-supporting carrier, while maintaining the maximum temperature of the catalyst layer to be at most 130° C., to obtain formed gas containing 2,3,3,3-tetrafluoropropene, and then, contacting the formed gas discharged from the reactor, with alkali at a temperature of at most 100° C.