The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2013
Filed:
Sep. 12, 2011
Hisayoshi Watanabe, Tokyo, JP;
Hideyuki Yatsu, Tokyo, JP;
Takayuki Nishizawa, Tokyo, JP;
Masashi Sano, Tokyo, JP;
Hiromichi Umehara, Tokyo, JP;
Takayasu Kanaya, Tokyo, JP;
Tetsuji Hori, Tokyo, JP;
Hisayoshi Watanabe, Tokyo, JP;
Hideyuki Yatsu, Tokyo, JP;
Takayuki Nishizawa, Tokyo, JP;
Masashi Sano, Tokyo, JP;
Hiromichi Umehara, Tokyo, JP;
Takayasu Kanaya, Tokyo, JP;
Tetsuji Hori, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
The present invention relates to a method of making a mask for patterning a thin film. The method includes a step of forming an inorganic material, which is resolvable into alkali solution, on a substrate; a step of forming the inorganic material in a predetermined pattern; and a step of narrowing the inorganic material with the alkali solution to form the mask.