The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2013

Filed:

Sep. 03, 2008
Applicants:

Kazuhiro Yamada, Osaka, JP;

Takamasa Tamura, Osaka, JP;

Yasuhiro Tanaka, Hyogo, JP;

Inventors:

Kazuhiro Yamada, Osaka, JP;

Takamasa Tamura, Osaka, JP;

Yasuhiro Tanaka, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/22 (2006.01); G02B 7/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

An antireflection structure having a high antireflection effect is provided. An antireflection structure () reduces reflection of light having a wavelength equal to or larger than a predetermined wavelength, and absorbs the light whose reflection is reduced. The antireflection structure () includes a base structure portion () which is configured to have a plurality of structural units () arranged on a reference plane, and each having a tilted surface () so that an angle between the first side surface () and a reference plane () is a predetermined angle, and a plurality of fine concave/convex portions (, . . . ) which are formed on a surface of the base structure portion (), and arranged within a cycle equal to or smaller than the predetermined wavelength.


Find Patent Forward Citations

Loading…