The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2013
Filed:
Jul. 31, 2012
Applicants:
Hirofumi Sakai, Nagano, JP;
Toru Shinohara, Nagano, JP;
Inventors:
Hirofumi Sakai, Nagano, JP;
Toru Shinohara, Nagano, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/15 (2006.01); B41J 2/145 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pattern film formation method includes: discharging liquid from at least one first discharge head toward a first pattern film formation region on a substrate; and discharging liquid from a plurality of second discharge heads toward a second pattern film formation region that is narrower than the first pattern film formation region. A number of the second discharge heads is greater than a number of the at least one first discharge head.
Sakai, Hirofumi. (2013). Pattern film formation method and organic el device manufacturing method (U.S. Patent No. 8529019). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8529019
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile