The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2013

Filed:

Jul. 22, 2011
Applicants:

Yoshinori Otsuki, Kyoto, JP;

Masayoshi Shinohara, Kyoto, JP;

Kazuo Hanada, Kyoto, JP;

Inventors:

Yoshinori Otsuki, Kyoto, JP;

Masayoshi Shinohara, Kyoto, JP;

Kazuo Hanada, Kyoto, JP;

Assignee:

Horiba, Ltd., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a gas analyzerand a gas analyzing systemadapted to introduce and analyze a part of a measurement target gas flowing through a measurement target gas flow passage, in order to ensure accuracy in controlling the measurement target gas flowing through the measurement target gas flow passageand accuracy in its own and other measurements, there are provided an object measurement deviceadapted to acquire a part of the measurement target gas introduced from the measurement target gas flow passageso as to measure a quantity etc. of a measurement object contained in the measurement target gas, an acquired gas flow rate measurement deviceadapted to measure a flow rate of the measurement target gas acquired by the object measurement device, and a gas supply deviceadapted to supply another gas of a flow rate equal to the gas flow rate measured by the acquired gas flow rate measurement deviceto a portion downstream of a shunt point in the measurement target gas flow passage


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