The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
Dec. 15, 2010
Applicants:
Yoonna OH, Seongnam-si, KR;
Jae-pil Shin, Suwon-si, KR;
Jin Choi, Seoul, KR;
Moon-hyun Yoo, Hwaseong-si, KR;
Jong-bae Lee, Seongnam-si, KR;
Inventors:
Yoonna Oh, Seongnam-si, KR;
Jae-Pil Shin, Suwon-si, KR;
Jin Choi, Seoul, KR;
Moon-Hyun Yoo, Hwaseong-si, KR;
Jong-Bae Lee, Seongnam-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a method of inspecting a mask, an image of a pattern on the mask may be obtained. A histogram of the image by grey levels may be obtained. The histogram may be compared with information of the pattern to detect a defect of the mask. Thus, reliability of defect detection in the mask may be remarkably improved.