The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
Mar. 31, 2008
Brian W. Baird, Portland, OR (US);
Clint R. Vandergiessen, Beaverton, OR (US);
Steve Swaringen, Rockwall, TX (US);
Robert Hainsey, Portland, OR (US);
Yunlong Sun, Beaverton, OR (US);
Kelly J. Bruland, Portland, OR (US);
Andrew Hooper, Beaverton, OR (US);
Brian W. Baird, Portland, OR (US);
Clint R. Vandergiessen, Beaverton, OR (US);
Steve Swaringen, Rockwall, TX (US);
Robert Hainsey, Portland, OR (US);
Yunlong Sun, Beaverton, OR (US);
Kelly J. Bruland, Portland, OR (US);
Andrew Hooper, Beaverton, OR (US);
Electro Scientific Industries, Portland, OR (US);
Abstract
Processing workpieces such as semiconductor wafers or other materials with a laser includes selecting a target to process that corresponds to a target class associated with a predefined temporal pulse profile. The temporal pulse profile includes a first portion that defines a first time duration, and a second portion that defines a second time duration. A method includes generating a laser pulse based on laser system input parameters configured to shape the laser pulse according to the temporal pulse profile, detecting the generated laser pulse, comparing the generated laser pulse to the temporal pulse profile, and adjusting the laser system input parameters based on the comparison.