The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
Aug. 27, 2009
Haruyasu Ito, Hamamatsu, JP;
Naoya Matsumoto, Hamamatsu, JP;
Takashi Inoue, Hamamatsu, JP;
Hamamatsu Photonics K.K., Hamamatsu-shi, Shizuoka, JP;
Abstract
In an aberration-correcting method according to an embodiment of the present invention, in an aberration-correcting method for a laser irradiation devicewhich focuses a laser beam on the inside of a transparent medium, aberration of a laser beam is corrected so that a focal point of the laser beam is positioned within a range of aberration occurring inside the medium. This aberration range is not less than n×d and not more than n×d+Δs from an incidence plane of the medium, provided that the refractive index of the mediumis defined as n, a depth from an incidence plane of the mediumto the focus of the lensis defined as d, and aberration caused by the mediumis defined as Δs.