The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2013

Filed:

Feb. 25, 2011
Applicants:

Harun H. Solak, Brugg, CH;

Francis S. M. Clube, Hausen, CH;

Christian Dais, Turgi, CH;

Inventors:

Harun H. Solak, Brugg, CH;

Francis S. M. Clube, Hausen, CH;

Christian Dais, Turgi, CH;

Assignee:

Eulitha A.G., Villigen, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for illuminating the mask with an intensity of monochromatic light to generate a transmitted light-field for exposing the recording layer, and illuminating the mask for an exposure time while changing the separation by a distance having a desired value and with a rate of change of separation, wherein at least one of the rate of change of separation and the intensity of light are varied during the change of separation, whereby the mask is illuminated by an energy density per incremental change of separation that varies over said distance.


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