The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2013

Filed:

Jun. 01, 2007
Applicants:

Ellen O. Aeling, St. Paul, MN (US);

John R. David, Stillwater, MN (US);

Michael A. Meis, Stillwater, MN (US);

Ronald S. Steelman, Woodbury, MN (US);

Inventors:

Ellen O. Aeling, St. Paul, MN (US);

John R. David, Stillwater, MN (US);

Michael A. Meis, Stillwater, MN (US);

Ronald S. Steelman, Woodbury, MN (US);

Assignee:

3M Innovative Properties Company, Saint Paul, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01R 33/00 (2006.01); F21S 4/00 (2006.01); F21V 21/002 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present disclosure is generally directed to illumination devices, and methods for making the same. The device, in particular, includes a first conductor layer, a first insulator layer disposed on the first conductor layer and having at least one first aperture defined therein through the first insulator layer, a second conductor layer disposed on the first insulator layer and having at least one second aperture defined therein through the second conductor layer and positioned to align with the at least one first aperture, and a light manipulation layer disposed on the second conductor layer and having at least one pair of apertures defined therein through the light manipulation layer including a third aperture and a fourth aperture, where the third aperture is positioned to align with the at least one second and first apertures.


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