The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2013

Filed:

Jun. 14, 2012
Applicant:

Sven Matthias, Lenzburg, CH;

Inventor:

Sven Matthias, Lenzburg, CH;

Assignee:

ABB Technology AG, Zurich, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A bipolar diode is provided having a drift layer of a first conductivity type on a cathode side and an anode layer of a second conductivity type on an anode side. The anode layer includes a diffused anode contact layer and a double diffused anode buffer layer. The anode contact layer is arranged up to a depth of at most 5 μm, and the anode buffer layer is arranged up to a depth of 18 to 25 μm. The anode buffer layer has a doping concentration between 8.0*10and 2.0*10cmin a depth of 5 μm and between 1.0*10up to 5.0*10cmin a depth of 15 μm (Split C and D), resulting in good softness of the device and low leakage current. Split A and B show anode layer doping concentrations of known diodes, which have either over all depths lower doping concentrations resulting in high leakage current or enhanced doping concentration resulting in bad softness.


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