The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2013

Filed:

Oct. 01, 2010
Applicant:

Yuehu Pu, Tokyo, JP;

Inventor:

Yuehu Pu, Tokyo, JP;

Assignee:

Mitsubishi Electric Corporation, Chiyoda-Ku, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A particle beam irradiation system comprising a first deflector having the maximum deflection amount which enables to move a particle beam in one direction to the maximum width of a target and a second deflector having the maximum deflection amount is less than the maximum deflection amount of the first deflector performs a control in which the particle beam is moved by increasing at least a deflection amount of the second deflector when the particle beam is moved, and performs a deflection substitution control in which a deflection of the second deflector is substituted to a deflection of the first deflector by decreasing the deflection amount of the second deflector and changing a deflection amount of the first deflector so as to make a position of the particle beam in the target dwell when the particle beam dwells.


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