The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
May. 17, 2011
Dae-hyuk Kang, Hwaseong-si, KR;
Jung-won Lee, Gunpo-si, KR;
Bo-un Yoon, Seoul, KR;
Kun-tack Lee, Suwon-si, KR;
Dae-Hyuk Kang, Hwaseong-si, KR;
Jung-Won Lee, Gunpo-si, KR;
Bo-Un Yoon, Seoul, KR;
Kun-Tack Lee, Suwon-si, KR;
Abstract
In a method of forming an isolation layer, first and second trenches are formed on a substrate. The first and the second trenches have first and second widths, respectively, and the second width is greater than the first width. A second isolation layer pattern partially fills the second trench. A first isolation layer pattern and the third isolation layer pattern are formed. The first isolation layer pattern fills the first trench, and the third isolation layer pattern is formed on the second isolation layer pattern and fills a remaining portion of the second trench.