The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
May. 13, 2010
Karl E. Benson, St. Paul, MN (US);
Richard G. Hansen, Mahtomedi, MN (US);
Stephen A. Johnson, Woodbury, MN (US);
Charles M. Leir, Falcon Heights, MN (US);
Richard Y. Liu, Woodbury, MN (US);
Mark D. Purgett, Oakdale, MN (US);
Hildegard M. Schneider, Woodbury, MN (US);
Audrey A. Sherman, St. Paul, MN (US);
Karl E. Benson, St. Paul, MN (US);
Richard G. Hansen, Mahtomedi, MN (US);
Stephen A. Johnson, Woodbury, MN (US);
Charles M. Leir, Falcon Heights, MN (US);
Richard Y. Liu, Woodbury, MN (US);
Mark D. Purgett, Oakdale, MN (US);
Hildegard M. Schneider, Woodbury, MN (US);
Audrey A. Sherman, St. Paul, MN (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
A multilayer film includes a first layer of a first polymeric material and a second layer of a second polymeric material. The first material has a first index of refraction and the second material has a second index of refraction less than the first index of refraction. In one embodiment, the second material includes a polydiorganosiloxane polyamide block copolymer. In another embodiment, the second material includes a polydiorganosiloxane polyoxamide block copolymer.