The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Oct. 03, 2011
Brian Kent Stephenson, Georgetown, TX (US);
David G. Hoch, Falmouth, ME (US);
L. Paul Collete, Iii, Westminster, MA (US);
Brian Kent Stephenson, Georgetown, TX (US);
David G. Hoch, Falmouth, ME (US);
L. Paul Collete, III, Westminster, MA (US);
Rockwell Automation Technologies, Inc., Mayfield Heights, OH (US);
Abstract
A technique is disclosed for asymmetrically controlling a process parameter based upon the direction of a prediction error between a predicted value determined using an inferential model and a laboratory measurement of the parameter. The present technique provides for the adaptive biasing of the predicted value based upon the direction of the prediction error. In one embodiment, a biasing factor may be determined by filtering the prediction error, such that the prediction error is emphasized more heavily in the biasing factor if the prediction error is in a less tolerable direction and emphasized less heavily if the prediction error is in the opposite direction. The biasing factor may further be determined as a function of a previous biasing factor computed during the process. Asymmetric control of the process parameter may be performed by controlling the parameter using model predictive control techniques based on the biased predicted values of the parameter.