The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Dec. 20, 2010
Kuan-hao Huang, Longtan Township, Taoyuan County, TW;
Fung-hsu Wu, Gueishan Township, Taoyuan County, TW;
Kuan-Hao Huang, Longtan Township, Taoyuan County, TW;
Fung-Hsu Wu, Gueishan Township, Taoyuan County, TW;
Benq Materials Corp., Taoyuan County, TW;
Abstract
A patterned retarder film and a method for manufacturing the same are provided. A patterned retarder film with a micro-structure comprises a first substrate, a phase retardation layer on the first substrate comprising a plurality of first retardation regions of liquid crystal materials and a plurality of second retardation regions of curable resin, wherein the structures of the first retardation regions and the second retardation regions are grating-like stripe structures and parallelly interleaved with each other and the first retardation regions provide a first phase retardation and the second retardation regions provide a second phase retardation; and a second substrate laminated on the phase retardation layer; wherein the first phase retardation and the second phase retardation are different by 180°. The method for manufacturing the patterned retarder film is also disclosed