The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Jan. 28, 2009
Katsumasa Fujita, Osaka, JP;
Minoru Kobayashi, Osaka, JP;
Kazuya Kikuchi, Osaka, JP;
Shin Mizukami, Osaka, JP;
Satoshi Kawata, Osaka, JP;
Shogo Kawano, Osaka, JP;
Katsumasa Fujita, Osaka, JP;
Minoru Kobayashi, Osaka, JP;
Kazuya Kikuchi, Osaka, JP;
Shin Mizukami, Osaka, JP;
Satoshi Kawata, Osaka, JP;
Shogo Kawano, Osaka, JP;
Osaka University, Suita-shi, Osaka, JP;
Nanophoton Corporation, Osaka-shi, Osaka, JP;
Abstract
Provided is a nonlinear optical material, an optical recording material, an optical recording method, a photosensitive material, a photopolymerization initiator, and a photosensitizer. One exemplary aspect of the present invention is a photosensitive material used for photolithography for forming a pattern by irradiating a photoresist with excitation light which includes a donor moleculethat is excited by the excitation light, and an acceptor moleculethat is excited by energy transfer or charge transfer from the excited donor