The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2013

Filed:

Dec. 27, 2011
Applicants:

Li-wen Lai, Taichung, TW;

Yi-long Wang, Taichung, TW;

Chun-hao Chang, Kaohsiung, TW;

Tai-hung Chen, Taipei, TW;

Inventors:

Li-Wen Lai, Taichung, TW;

Yi-Long Wang, Taichung, TW;

Chun-Hao Chang, Kaohsiung, TW;

Tai-Hung Chen, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/448 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming an organic film is provided and includes followings. An apparatus is provided and includes a gas storage chamber, an evaporator, a pressure gauge, a pyrolysis chamber connected with the gas storage chamber, and a deposition chamber. The evaporator connects with the pyrolysis chamber through the gas storage. An organic material in the evaporator is evaporated to form organic gas, wherein the organic gas is passed into the gas storage chamber. When pressure of the organic gas in the gas storage chamber, measured by the pressure gauge, reaches a predetermined value, a valve between the evaporator and the gas storage chamber is turned off and another valve is turned on for passing the organic gas into the pyrolysis chamber. The organic gas is pyrolyzed in the pyrolysis chamber to form a monomer. The monomer is delivered to the deposition chamber for deposition to form an organic film.


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