The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Apr. 20, 2012
Christopher C. Striemer, Rochester, NY (US);
Philippe M. Fauchet, Pittsford, NY (US);
Thomas R. Gaborski, Pittsford, NY (US);
James L. Mcgrath, Fairport, NY (US);
Christopher C. Striemer, Rochester, NY (US);
Philippe M. Fauchet, Pittsford, NY (US);
Thomas R. Gaborski, Pittsford, NY (US);
James L. McGrath, Fairport, NY (US);
University of Rochester, Rochester, NY (US);
Abstract
A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.