The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
May. 06, 2011
Shizue Ogawa, Toyama, JP;
Kazuyuki Toyoda, Toyama, JP;
Motonari Takebayashi, Toyama, JP;
Tadashi Kontani, Toyama, JP;
Nobuo Ishimaru, Takaoka, JP;
Shizue Ogawa, Toyama, JP;
Kazuyuki Toyoda, Toyama, JP;
Motonari Takebayashi, Toyama, JP;
Tadashi Kontani, Toyama, JP;
Nobuo Ishimaru, Takaoka, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
A substrate processing apparatus comprising: a processing chamber which is to accommodate at least one substrate; a gas supply system which is to supply processing gas into the processing chamber; an exhaust system which is to exhaust atmosphere in the processing chamber; and at least one pair of electrodes which are to bring the processing gas into an active state and which are accommodated in protection tubes such that the electrodes can be inserted into and pulled out from the protection tubes, wherein the electrodes are accommodated in the protection tube in a state where at least a portion of the electrodes is bent, and the electrodes are formed of flexible members, is disclosed.