The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2013

Filed:

Jun. 03, 2010
Applicants:

Jeng-ming Lai, Taipei Hsien, TW;

Ming-chang Wu, Taipei Hsien, TW;

Wei-chung Hsiao, Taipei Hsien, TW;

Shih-huai Cho, Taipei Hsien, TW;

Inventors:

Jeng-Ming Lai, Taipei Hsien, TW;

Ming-Chang Wu, Taipei Hsien, TW;

Wei-Chung Hsiao, Taipei Hsien, TW;

Shih-Huai Cho, Taipei Hsien, TW;

Assignee:

Wistron Corporation, Xizhi Dist., New Taipei, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F16K 47/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

By using a base in cooperation with a moving board, a first flowing area formed by a plurality of openings on the base may be partially blocked by the moving board moving relative to the base, thereby forming a second flowing area that provides different flow resistances. The flow resistance of an adjustable flow resistance device can be adjusted easily and dynamically, without replacing to another device. The flow resistance of the device may also be adjusted to various predefined default settings precisely and speedily by further applying a positioning mechanism that utilizes various predefined positioning holes or a rotary element.


Find Patent Forward Citations

Loading…