The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Jan. 22, 2007
Takahiko Wakatsuki, Kanagawa-ken, JP;
Naoya Hayamizu, Kanagawa-ken, JP;
Hiroshi Fujita, Kanagawa-ken, JP;
Akiko Saito, Kanagawa-ken, JP;
Toshihide Hayashi, Kanagawa-ken, JP;
Yukinobu Nishibe, Kanagawa-ken, JP;
Takahiko Wakatsuki, Kanagawa-ken, JP;
Naoya Hayamizu, Kanagawa-ken, JP;
Hiroshi Fujita, Kanagawa-ken, JP;
Akiko Saito, Kanagawa-ken, JP;
Toshihide Hayashi, Kanagawa-ken, JP;
Yukinobu Nishibe, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A processing apparatus includes: a processing chamber configured to contain a workpiece; a first nozzle provided in the processing chamber, the first nozzle discharging vapor onto the workpiece; a wall enclosing the processing chamber; a fluid channel provided inside the wall; a fluid inlet; and a fluid outlet. The fluid inlet is provided in communication with the fluid channel. The fluid outlet is provided in communication with the fluid channel, where a fluid flows into the fluid inlet, passes through the fluid channel, and flows out of the fluid outlet. A processing method for processing a workpiece moving in a processing chamber, the processing method includes: discharging a vapor from a first nozzle toward the workpiece while flowing a fluid through a fluid channel which is provided inside a wall, the wall enclosing the processing chamber.